Method and apparatus for removing particles from surface of article

ABSTRACT

An apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

This application is a Division of Ser. No. 08/963,685 filed Nov. 4,1997.

BACKGROUND OF THE INVENTION

The present invention relates to a method and an apparatus for removingparticles from a surface of an article, such as a semiconductor wafer ina clean room, a reactor for coating a surface of a semiconductor deviceand its peripheral equipment, and a glass for liquid crystal.

A clean room is used to produce semiconductor devices and like, and isrequired to be free of particles such as dust so as to provide a surfaceof a semiconductor wafer free of particles. Recently, it has beenrequired, for example, to remove particles from a semiconductor waferhaving a dimension as small as several micrometers and preferablyparticles having a dimension smaller than one micrometer.

A conventional method for cleaning particles from a surface of anarticle includes a contact process and a non-contact process, as shownin FIG. 8. The contact process includes a fixed brush vacuum process anda rotating brush vacuum process. Both of the contact processes allow theremoval of particles having a dimension of not less than scores ofmicrometers, but does not remove particles having a dimension of up toscores of micrometers.

The non-contact process includes a vacuum process, an air knife process,and a ultrasonic air process. The vacuum process removes particleshaving a dimension of not less than about 100 micrometers, and the airknife process does not enable the removal of particles having adimension of not more than scores of micrometers. The ultrasonic airprocess allows the removal of particles having a dimension as small asseveral micrometers. However, the ultrasonic air process does not enablethe removal of particles having a dimension of not more than 1micrometer.

The present inventors have proposed removing particles from a wafer byirradiation with an ultraviolet ray, a radiation ray and a laser rayonto a wafer, thereby emitting a photoelectron therefrom so as to removethe particles therefrom (please refer to JP-A-4-239,131 andJP-A-6-296,944). However, a surface of a wafer is directly irradiated byan ultraviolet ray, a laser ray, or a radiation ray in this process.Therefore, if a surface of the wafer is sensitive to these rays, thewafer surface may undergo an unfavorable chemical reaction, therebylimiting its application.

SUMMARY OF THE INVENTION

In view of the foregoing, it is an object of the present invention toprovide a method and an apparatus for removing particles from a surfaceof an article, which allows the removal of even particles having adimension of less than one micrometer.

According to one aspect of the present invention, there is provided amethod for removing particles from a surface of an article comprising:supplying the particles with an electric charge; and applying at leastone of an ultrasonic wave and a gas stream onto the surface of thearticle while applying a first electric field for driving away theelectrically charged particles from the surface of the article.Electrostatic force driven by the first electric field along with theapplication of an ultrasonic wave and/or gas facilitates the removal ofthe particles from the surface.

Preferably, the supplying step comprises bombarding the surface of thearticle with at least one of electrons and negatively charged ions so asto negatively charge the particles.

The supplying step may comprise the step of irradiating at least one ofan ultraviolet ray and a radiation ray onto a photoelectron emittingmaterial in the presence of at least 1 part per million of one ofgaseous oxygen and water so as to produce a negatively charged ion. Thesupplying step may further comprise the step of applying a secondelectric field for driving the negatively charged ion in a directiontoward the surface of the article, whereby the negatively charged ioninteracts with the particles so as to supply them with an electriccharge. Alternatively, convection generated by the irradiation of theultraviolet ray carries the negatively charged ions to the particles onthe surface of the article.

Preferably, the supplying step comprises the step of conducting electricdischarge to produce a negatively charged ion.

Preferably, the supplying step may further comprise the step of applyinga second electric field for driving the negatively charged ion in adirection toward the surface of the article, whereby the negativelycharged ion interacts with the particles so as to supply the particleswith an electric charge. Alternatively, convection generated by theirradiation of the ultraviolet ray carries the negatively charged ionsto the particles on the surface of the article.

Preferably, the method further comprises the step of collecting theparticles removed from the surface. The collecting step may comprise thestep of supplying the particles removed from the surface with at leastone of electrons and negatively charged ions. The collecting step maycomprise the steps of: irradiating at least one of an ultraviolet rayand a radiation ray onto the photoelectron emitting material in thepresence of at least 1 part per million of one of gaseous oxygen andwater so as to produce a negatively charged ion; and applying a secondelectric field for driving the negatively charged ion in a directiontoward the surface of the article. Alternatively, the collecting stepmay comprise the step of conducting electric discharge to produce anegatively charged ion.

Preferably, particles having a dimension of not more than 5 micrometersare removed from the surface of the article. Further preferably,particles having a dimension of not more than 1 micrometer are removedfrom the surface of the article. Preferably, the particles have adimension of at least 0.1 micrometer.

Preferably, the article comprises a semiconductor wafer being disposedabove a first electrode. Preferably, the article comprises asemiconductor wafer standing and being close to a first electrode.

Preferably, the first electric field ranges from 10 volts to 100kilovolts per centimeter. Preferably, the second electric field rangesfrom 0.1 volts to 2 kilovolts per centimeter. Preferably, the secondelectric field ranges from 10 volt to 1 kilovolts per centimeter.

According to another aspect of the present invention, there is providedan apparatus for removing a particle from a surface of an articlecomprising: an ionizing device for supplying particles on a surface ofan article with an electric charge; at least one of an ultrasonicgenerator for applying an ultrasonic wave to a surface of an article anda stream source for generating a gas stream onto a surface of anarticle; and a first electrode for forming an electric field for drivingelectrically charged particles from a surface of an article.

Preferably, the ultrasonic generator comprises at least one of apiezoelectric oscillator, a polymer piezoelectric membrane, anelectrostrictive oscillator, a Langevin oscillator, a magnetostrictiveoscillator, an electrodynamic transformer, and a capacitor transformer.Further preferably, the ultrasonic generator comprises a piezoelectricoscillator.

Preferably, the stream source comprises an air knife.

Preferably, the ionizing device comprises a photoelectron emittingmaterial and a light source for irradiating at least one of anultraviolet ray and a radiation ray onto the photoelectron emittingmaterial.

Preferably, the ionizing device is capable of conducting electricdischarge. Preferably, the ionizing device comprises a pair of secondelectrodes wherein electricity passes through a gas between the secondelectrodes. Preferably, the ionizing device comprises a heater forgenerating convection.

Preferably, an apparatus further comprises a trap for collecting aparticle removed from an article. The trap may comprise a thirdelectrode for trapping particles removed from an article.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic view of one embodiment in accordance with thepresent invention.

FIG. 2 is a schematic view of another embodiment in accordance with thepresent invention.

FIG. 3 is a cross section of the ionization device 40 in FIG. 2.

FIG. 4 is a schematic view of another embodiment in accordance with thepresent invention.

FIG. 5 is a schematic view of another embodiment in accordance with thepresent invention.

FIG. 6 is a cross section of the ionization device 60 in FIG. 5.

FIG. 7 is a schematic view of another embodiment in accordance with thepresent invention.

FIG. 8 is a graph showing a limit of removable particle size inmicrometers.

PREFERRED EMBODIMENTS OF THE INVENTION

In the present invention, particles present on a surface of an articleare supplied with electric charge. The surface of the article may bebombarded with electrons and/or negatively charged ions so as tonegatively charge the particles.

In the present invention, photoelectrons may be used to supply particleson a surface of an article with an electric charge. Alternatively,electric discharge may be used to supply the particles with an electriccharge. Similarly, photoelectrons and electric discharge may be used tosupply particles removed from the surface of the article with anelectric charge so as to facilitate trapping thereof.

In the present invention, any photoelectron emitting material that emitsphotoelectrons upon exposure to an ultraviolet ray and/or a radiationray may be used. Preferably, the photoelectron emitting material mayhave a small work function for producing a photoelectron. From the viewpoint of efficiency and cost, the material may be made of at least oneof Ba, Sr, Ca, Y, Gd, La, Ce, Nd, Th, Pr, Be, Zr, Fe, Ni, Zn, Cu, Ag,Pt, Cd, Pb, Al, C, Mg, Au, In, Bi, Nb, Si, Ti, Ta, U, B, Eu, Sn, P and Wor any compound or alloy containing these elements or any combinationthereof. These material may be used either on their own or as anadmixture. A composite of these materials may be used such as anamalgam.

Compounds that can be used for the photoelectron emitting materialsinclude, oxides, borides, and carbides. Exemplary oxides include BaO,SrO, CaO, Y₂O₃, Cd₂O₃, Nd₂O₃, ThO₂, ZrO₂, Fe₂O₃, ZnO, CuO, Ag₂O, La₂O₃,PtO, PbO, Al₂O₃, MgO, In₂O₃, BiO, NbO, and BeO. Exemplary boridesinclude YB₆, CdB₆, LaB₅, NdB₆, CeB₆, EuB₆, PrB₆ and ZrB₂. Exemplarycarbides include UC, ZrC, TaC, TiC, NbC, and WC.

Alloys that can be used for the photoelectron emitting materials includebrass, bronze, phosphor bronze, alloys of Ag and Mg(2 to 20 percent byweight of Mg), alloys of Cu and Be(1 to 10 percent by weight of Be) andalloys of Ba and Al. Alloys of Ag—Mg, Cu—Be and Ba—Al systems arepreferred. The oxides can be obtained by either heating a metal surfacein air for oxidation or oxidizing the metal surface with chemicals.

Another method that can be adopted is to heat the metal surface prior touse so as to form a stable oxide layer thereon. For example, an alloy ofMg and Ag is heated in water vapor at a temperature ranging from 300° to400° C. so as to form an oxide film thereon. The oxide film remainsstable for a long period of time.

JP-B-7-93098 discloses a thin film of Au, which serves as thephotoelectron emitting material, coated onto a quartz glass serving as amatrix. The quartz glass transmits an ultraviolet ray. The disclosure ofJP-B-93098 is incorporated herein as reference. As proposed inJP-A-5-68875, electrical conductor may be incorporated along with thephotoelectron emitting material to a matrix. The disclosure ofJP-A-5-68875 is incorporated herein as reference.

The photoelectron emitting material may be used in variousconfigurations including a bar or rod shape, a linear shape, a fibershape, a grid shape, a plate shape, a plated shape, a curved shape, acylindrical shape, a screen shape. Preferably, shapes provide a largearea for exposed to an ultraviolet ray or a radiation ray. As disclosedin JP-A-4-243540, the photoelectron emitting material may be coated ontoa surface of an ultraviolet-ray source such as an ultraviolet lampand/or a surface of its vicinity. The configuration in use may bedetermined, depending on application, the shape and the structure of anapparatus, and so on.

The radiation source for emitting photoelectrons from the photoelectronemitting materials is not limited, provided that the radiation sourcegenerates, upon irradiation, photoelectrons from the photoelectronemitting material. The radiation source includes an ultraviolet ray, aradiation ray, electromagnetic waves, and a laser, and can be selectedin view of an area of application, a size of an apparatus, a shape andeffects. In view of effects and smooth operations, usually anultraviolet ray and/or a radiation ray are preferable.

A type of the ultraviolet ray is not limited, provided that theradiation source generates, upon irradiation, photoelectrons from thephotoelectron emitting material. A source of the ultraviolet ray can beselected in view of an area of application, the shape and the structureof the apparatus, its operations, cost and the like. For example, thesource of the ultraviolet ray includes mercury lamps, hydrogen dischargetubes, xenon discharge tubes and Lyman discharge tubes. Moreover,sterilizing lamps, chemical lamps, black lamps, and fluorescent chemicallamps may be used.

A radiation ray is not limited provided that the irradiation thereofemits photoelectrons from the photoelectron emitting material.Conventional process of generating the radiation ray can be used.Preferably, the radiation ray has a sterilizing action. For example,¹³⁷Ce, ⁶⁰Co, both of which have sterilizing actions, are preferably usedas a source of radiation ray. A source of the radiation ray can beselected in view of an area of application, its operations, cost and thelike.

The radiation ray include, for example, an alpha rya, a beta ray, and agamma ray. The source of the radiation ray includes radioactive isotopessuch as cobalt 60, cesium 137, strontium 90; radioactive wastes producedin a nuclear reactor; radioactive materials produced by suitablytreating the radioactive wastes; the nuclear reactor itself; a particleaccelerator such as electron accelerator, etc.

Electrode is explained hereinafter. Electrodes may be used for emittingphotoelectrons, accelerating the photoelectrons, removing chargedparticles from a surface of an article, and trapping floating particlesremoved from the surface. An independent electrode may be used for eachof the purposes. Alternatively, the same electrode may be shared for anycombination of the purposes.

Preferably, an electric field is formed between the photoelectronemitting materials serving as a cathode and an electrode serving as ananode for driving the photoelectrons from the photoelectron emittingmaterials to the electrode. The electric field facilitates emission ofphotoelectrons from the photoelectron emitting material also. Theelectrode for the anode may be disposed close to the article so thatphotoelectrons are bombarded into the surface of the article whereparticles are present. The electric field may range from 0.1 volt percentimeter to 2 kilovolts per centimeter.

The photoelectrons may interact with gaseous oxygen and water to producenegatively charged ions. The electric field drives the negativelycharged ions along with the photoelectrons in a direction to the anode.The negatively charged ions and the photoelectrons interact with theparticle so as to supply the particles with an electric charge.

The electrodes may be made of any conductive materials, which include,for example, tungsten, stainless steel, an alloy made of Cu and Zn. Theelectrode may have a configuration of a bar, a line, a grid, a plate, apleated plate, a curved surface, a cylindrical shape, a net, etc. Thepresence or absence of the electric field, the strength thereof,materials and shape of the electrode, may depend on an area ofapplication, a type and structure of an apparatus, required performance,and may be selected upon a preliminary test.

Alternatively, in the present invention, electric discharge can be usedto supply the particles with an electric charge. The electric dischargecan be used to supply particles removed from the surface of the articlewith an electric charge so as to facilitate trapping thereof.

In the present specification, the electric discharge refers to a passageof electricity through a gas. The electric discharge may include coronadischarge, glow discharge, arc discharge, spark discharge, creepingdischarge, pulse discharge, high frequency discharge, laser discharge,trigger discharge, plasma discharge and so on. A conventional method forgenerating the electric discharge can be used in the present invention.

The creeping discharge and the pulse discharge provide an increasedconcentration of ions, thereby making the apparatus smaller. Thefeatures are preferable in some applications. The corona discharge issimple, easy to operate and effective. Therefore, corona discharge ispreferable in other applications.

In generating electric discharge, in general, it is preferable togenerate negatively charged ions to positively charged ions sincenegatively charged ions tends to move further than positively chargedions.

When the presence of an ozone gas is preferable, the negatively chargedions may be produced by electric discharge, such as the coronadischarge. The negatively charged ions tends to produce the ozone gasmore than the positively charged ions. A surface of an article may havean organic matter, which may or may not be particles, and the presenceof the ozone gas oxidizes the organic matter to decompose thereof.Therefore, organic matter and other particles may be removedsimultaneously.

In contrast, when the presence of the ozone gas is not preferably,positively charged ions may be produced by electric discharge.

A discharge electrode and a complimentary electrode for electricdischarge may be made of a conventional material and have a conventionalconfiguration. The configuration includes a needle shape, a plate shape,a grid shape, a line shape, a sphere shape, a corrugated shape, apleated shape, a comb-like shape and so on.

In general, a voltage ranging from 1 kilovolt to 80 kilovolts is appliedto generate corona discharge.

In the present invention, at least one of an ultrasonic wave and a gasstream onto the surface of the article is applied while an electricfield is applied for driving away the electrically charged particlesfrom the surface of the article, thereby efficiently removing particlesfrom the surface of the article. The article may be a semiconductorwafer in a clean room, a reactor for coating a surface of asemiconductor device and its peripheral equipment, and a glass forliquid crystal. The reactor may be made of aluminum or stainless steel.

Typically, a pair of electrodes may be used for forming an electricfield for driving away the electrically charged from the surface of thearticle. The anode for driving the photoelectrons from the photoelectronemitting materials serving as a cathode may be converted to a cathodefor driving away the electrically charged particles from the surface ofthe article. The cathode for driving away the electrically chargedparticles may be disposed on the opposite side of the surface of thearticle with respect to particles. The complimentary anode for drivingaway the electrically charged particles may be independently disposed inthe same side of the surface of the article with respect to theparticles. Alternatively, the complimentary cathode may be thephotoelectron emitting materials.

The electrode for driving away the electrically charged particles from asurface of an article are not limited as long as the electrodes arecapable of forming an electric field. The electrode may be made of anyconductive material such as a Cu—Zn alloy, stainless steel, tungsten.The configuration of the electrode may include a linear shape, a barshape, a net shape, a grit shape, a plate shape and so on.

The electric field for driving away the electrically charged particlesfrom the surface of the article may range from 10 volts to 100 kilovoltsper centimeter, and preferably range from 0.1 volts to 2 kilovolts percentimeter. A suitable strength for the electric field depends on theconfiguration and properties of a surface of an article where particlesare present, chemical composition and an amount of electric charge ofthe particles , and a preliminary test may be conducted to determine thestrength of the electric field.

In the present invention, the formation of the electric field along withparticles electrically charged facilitate the removal of the particles.Electrostatic force driven by the electric field facilitate the removalof the particles from the surface. The application of an ultrasonic waveand/or gas further facilitate the removal.

In the method in accordance with the present invention, an ultrasonicwave and/or a gas stream is applied onto the surface of the article. Theultrasonic wave may range from 1 kKz to 5,000 kHz, and preferably from10 kHz to 300 kHz. The ultrasonic wave may be generated by an ultrasonicgenerator.

A gas stream may be applied by an air knife. The gas stream refers to aflow of a pressurized gas at a high speed. For example, a particle-freeair, a particle-free inert gas such as a nitrogen gas may be used.

The apparatus in accordance with the present invention has an ultrasonicgenerator for applying an ultrasonic wave to a surface of an articleand/or a stream source for generating a gas stream onto a surface of anarticle. The ultrasonic generator may include a piezoelectricoscillator, a polymer piezoelectric membrane, an electrostrictiveoscillator, a Langevin oscillator, a magnetostrictive oscillator, anelectrodynamic transformer, and a capacitor transformer. Preferably, theultrasonic generator may include a piezoelectric oscillator. The streamsource may include an air knife.

In the present invention, both the ultrasonic wave and the gas streammay be applied to a surface of an article. Alternatively, either theultrasonic wave or the gas stream may be applied to a surface of anarticle. When the particles have smaller diameters, the application ofboth the ultrasonic wave and the gas stream is particularly effectivefor removing particles. Conditions for removing electrically chargedparticles, which include the presence or absence of the combination,frequency of ultrasonic waves and a process for producing the same, thepressure and speed of the gas stream and so on, depend on the apparatus,a type and size of particle, type and configuration of a surface wherethe particle is present, the strength of electric field, the size andconfiguration of the apparatus, performance required and so on.Preferably, the conditions of removing the electrically chargedparticles may be determined by a preliminary test.

In the present invention, preferably, the particles removed from thesurface of the article may be collected so as to prevent an ambientatmosphere from being contaminated. The particles removed areelectrically charged as explained above, and the trap which is chargedwith an opposite electric charge may be disposed above the article. Forexample, when the particles are negatively charged, the trap may bepositively charged, and the trap may be an electrode serving as ananode. When the particles removed have a small diameter or an electriccharge thereon is not sufficient, the particles removed may be suppliedwith a further electric charge by way of photoelectrons or electricdischarge, as explained above. The process including the steps of:supplying the removed particles with photoelectrons and trapping them bythe trapping member is disclosed in the aforementioned documents, aswell as “Aerosol Study” vol. 8, issue 3, pages 239-248, 1993; “CleanTechnology” vol. 8. issue 7, pages 63-67, 1995.

The trap for charged particles can be of any suitable type. Examplesinclude dust collecting plates, various electrode for collecting dust,and electrostatic filter. The trap further includes a woolly structure,which serves as an electrode itself, for example, a steel wool electrodeand a tungsten wool electrode. Electret assemblies can also be used.

Dust collecting plates, electrodes for collecting dust, and electrodeshaving a woolly structure such as steel wool electrode and tungsten woolelectrode are preferable since they are capable of trapping the removed,floating particles and of forming an electric field for supplying theremoved, floating particles with electric charge.

When the electric field is applied to trap the removed, floatingparticles, the electric field ranges from 10 volt to 1 kilovolts percentimeter.

EXAMPLES

The present invention is explained hereinafter by way of example.However, the following examples are illustrative and not limit thepresent invention

Example 1

FIG. 1 is a schematic view of an apparatus 10 of the present inventionin a clean room.

The apparatus 10 is disposed in a chamber 38, which in turn is disposedin a clean room. The apparatus 10 has a support 12 for supporting anelectrode 14 and the electrode 14, which may have a plate configuration.The electrode 14 may serve as a bed for mounting a wafer 30 having aplate configuration. Alternatively, a wafer may be held and stood in arack in generally transverse directions. The wafer 30 has a surface 32,and a plurality of particles 34 are present on the surface 32.

An apparatus 10 has a device 20 for emitting a photoelectron 29 towardthe electrode 14. The device 20 has an ultraviolet lamp 22 and, acoating 24 on a surface of the ultraviolet lamp. The coating 24 is madeof a photoelectron emitting material. The material is typicallyelectrically conductive, and the coating 24 may serve as one ofelectrodes for forming an electric field for driving a photoelectron.U.S. Pat. Nos. 4,750,917 and No. 5,225,000 disclose irradiating aphotoelectron emitting material with an ultraviolet ray and/or aradiation ray and supplying particles in a gas with electric charge. Theentire disclosure of both of the U.S. Patents are incorporated herein asreference.

An apparatus 10 has an ultrasonic generator 18 for applying anultrasonic wave to particles 34 on a surface 32 of a wafer 30. Theultrasonic generator may include a piezoelectric oscillator.

Another electrode 26 for trapping particles 34 removed from a wafer 30is disposed between the ultraviolet lamp 22 and the electrode 14. Theelectrode 26 may have a grid configuration and extend in directionsbeing parallel to the wafer 30.

In a method according to the present invention, the ultraviolet lamp 22is turned on so as to irradiate an ultraviolet ray onto the coating 24on the ultraviolet lamp 22, thereby emitting photoelectrons 29 from thecoating 24. While photoelectrons 29 are generated from the coating 24,electric current is applied to the coating 24 serving as a cathode andthe electrode 12 serving as an anode so as to form an electric field fordriving the photoelectrons 29 from the coating 24 to the electrode 14.During the passage, the photoelectrons 29 may interact with oxygen andwater molecules in an atmosphere so as to produce negatively chargedions thereof. The negatively charged ions along with the photoelectrons29 are driven toward the electrode 14 by the electric field. Thenegatively charged ions and/or photoelectrons 29 interact with particles34 on a surface 32 of a wafer 30 so as to supply the particles withelectric charge.

Subsequently, electric current is applied to the electrode 14 andelectrode 26 such that the electrode 14 and electrode 26 serve as acathode and an anode, respectively, so as to form an electric field fordriving the negatively charged particles 34 from the wafer 30 to theelectrode 26. Please note that the polarity of the electrode 14 ischanged from an anode and a cathode. Simultaneously, the ultrasonicgenerator 18 applies an ultrasonic wave to particles 34 on a surface 32of a wafer 30 so as to induce removal of the particles 34 from thesurface 32. Particles 34 are removed from the surface 32, and float overthe wafer 32.

In the present invention, preferably the particles removed from thewafer surface 32 is removed from a gas. The electrode 26 serving as thecathode may trap the floating particles.

Preferably, the floating particles are further ionized to facilitatetrapping by the anode 26. In general, larger particles are moresusceptible to becoming electrically charged and to being trapped by theelectrode 26 while smaller particles are less susceptible to becomingelectrically charged and to being trapped. In view of the foregoing,preferably, the ultraviolet lamp 22 is turned on again so as to emitphotoelectrons from the coating 24, and an electric current is appliedto the coating 24 serving as a cathode and the electrode 26 serving asan anode so as to drive the photoelectrons to the space over the wafer.Therefore, the space B is rich in negatively charged ions so as toionize the floating particles, thereby facilitating the trapping of thefurther ionized particles by the electrode 26.

Example 2

FIG. 2 is a schematic view of another embodiment of the presentinvention. The embodiment of FIG. 2 is the same as that of FIG. 1 exceptfor an ionization device 40. The device 40 is disposed above the wafer30.

FIG. 3 is a cross section of the device 40. The device 40 has a housing41 having a cylindrical configuration defining a bore extending along anaxial direction. The housing 41 is preferably made of an electricalinsulator. The electrical insulator may include a polymer material,preferably fluorinated polymer material and a ceramic material. Thehousing 41 has an electrode 46, which may have a mesh structure in acylindrical configuration being complementary in shape to an innersurface of the housing 41.

The device 40 has an ultraviolet lamp 42 having a cylindricalconfiguration, which may share an axis with the housing 41.Photoelectron emitting material 44, which is electrically conductive, iscoated onto a surface of the ultraviolet lamp. The housing 41 ispreferably held in a vertical direction so as to facilitate an upwardmovement of a local air in the bore therethrough.

In FIGS. 2 and 3, upon turning on the ultraviolet lamp 42, anultraviolet ray is irradiated onto the coating 44 so as to emitphotoelectrons while an electric current is applied to the coating 44 asa cathode and the electrode 46 as an anode so as to accelerate thephotoelectrons 49 in directions toward the electrode 46. Simultaneously,heat from the ultraviolet lamp 42 heats a local gas in the housing 41 soas to form convection through the bore in the housing 41. That is, thelocal gas in the bore moves upward through the bore in the housing 41while the local gas carries the photoelectrons 49 upward. Thisconvection further carries photoelectrons and resulting negativelycharged ions from the device 40 to the wafer 30 so as to ionize theparticles 34 on the surface 32 of the wafer.

The ultrasonic generator 18 applies an ultrasonic wave onto the surface32 of the wafer 30 while an electric current is applied to the electrode26 as a cathode and the electrode 46 as an anode so as to form anelectric field for driving the electrically charged particles from thesurface 32 of the wafer 30 to the electrode 46.

Preferably, the ultraviolet lamp 42 is turned on so as to generate theconvection for carrying the particles 34 removed from the surface 32 ofthe wafer to the lower end of the bore of the housing 41.Simultaneously, an electric field may be formed between the coating 42as a cathode and the electrode 64 as an anode so as to trap theparticles by the electrode 46.

Example 3

The chamber 38 containing the apparatus 10 of Example 1 is disposed in aclean room of class 10, and following experiments are carried out so asto confirm removal of particles from an article. In this specification,a class refers to a number of particles having a dimension of not lessthan 0.1 micrometer in one square feet. The chamber has a volume of 28liters.

A high purity silicon wafer having a diameter of five inches was used.Polystyrene latex, which may referred to PSL, standard particles havingan average dimension of 0.5 and 1.0 micrometers were placed on thesilicon wafer 30 in two runs, respectively.

To a surface of a bactericidal lamp of 6W was coated a gold layer havinga thickness of 10 nanometers. An electric field of 300 volts percentimeter for driving photoelectrons and negatively charged ions to thewafer 30 was formed between the coating 24 serving as a cathode and theelectrode 16 serving as an anode.

The ultrasonic generator 18 had a piezoelectric oscillator having 60kHz.

A dust detector for a wafer was used to determine the number of theparticles made of polystyrene latex on a surface 32 of the wafer 30.

The numbers of particles on a surface 32 of the wafer are shown in Table1 so as to show the removal of the particles.

TABLE 1 Run No. 1 2 3 4 5 ionization step done none done none noneultrasonic step done done done done none electric field step done donenone none none particle 0.5 μm 18 750 650 800 850 size 1.0 μm 15 800 650900 950

In Table 1, the ionization step refers to irradiating an ultraviolet rayonto the coating 24 by the ultraviolet lamp 22 so as to emitphotoelectrons 29 from the coating 24 and forming an electric fieldbetween the coating 24 and the electrode 14 for driving thephotoelectrons and negatively charged ions. The ultrasonic step refersto applying an ultrasonic wave to the surface 32 of the wafer 30. Theelectric field step refers to forming an electric field between theelectrode 14 and electrode 26 for driving charged particles 34 from thesurface 32 of the wafer 30 while applying the ultrasonic wave. “Done”refers to that the step was carried out. “None” refers to that the stepwas not carried out. The number refers to the number of particlespresent on the top circular surface of the wafer having a diameter of 5inches.

Example 4

Using the aforementioned apparatus 10 of Example 3, a further experimentwas carried out for removal of floating particles originated from theparticles 34 on the surface 32 of the wafer. The ionization step, theultrasonic step and the electric field step of Example 3 were carriedout in the same conditions in two runs. Polystyrene latex particleshaving an average dimension of 0.5 micrometers were used.

After the electric field step, in one of the runs, the ionization stepwas carried out again for a period of 30 minutes so as to facilitateremoval of floating particles originated from the wafer surface by theelectrode 26. In contrast, this ionization step was not carried out inthe other run.

Subsequently, a particle-free nitrogen gas was introduced into thechamber 38 so as to purge the air therein, followed by determining thenumber of floating particles having a dimension of not less than 0.1micrometers per square feet in the chamber 38 by a particle counter. Theresult is shown in Table 2

TABLE 2 ionization step the number of the particles per square feet done10 none 650-700

Example 5

The apparatus 10 of Example 3 was used except that the ultrasonicgenerator 18 was replaced by an air knife for applying a gas stream ontothe surface 32 of the wafer. The air knife provides a particle free N₂having a purity higher than 99.9999 with a pressure of two atmosphericpressures. Polystyrene latex having a dimension of 0.5 micrometers wereused as particles.

Similar to the result of Example 3, more than 80 percent of theparticles were removed by the method comprising the ionization step, theair-knife step and the electric field step according to the presentinvention.

In contrast, in a method comprising the ionization step and thesubsequent, air-knife step without carrying out the electric field step,more than 70 percent of the particles remained on the surface of thewafer.

In both runs, the particles removed from the surface were collected bythe subsequent ionization step.

Example 6

FIG. 4 is a schematic view of another embodiment of the presentinvention. The embodiment of FIG. 4 is the same as that of FIG. 1 exceptfor an ionization device 50 for electric discharge. The ionizationdevice 50 is disposed above the electrode 26.

The ionization device 50 has a support 52 and a plurality of needles 54protruding from the support 52. The needles serve as dischargeelectrodes for corona discharge.

In this embodiment, the corona voltage is applied to the dischargeelectrode 54, which serve as a cathode, and the electrode 26, whichserves as an anode, so as to generate a corona discharge. As a result, aplurality of negatively charged ions and electrons are generated in thevicinity of the discharge electrodes 54, and a shower of the negativelycharged ions and electrons are driven in a direction toward theelectrode 26 by an electric field between the cathode 54 and the anode26. The negatively charged ions interact with the particles 34 on thesurface 32 of the wafer 30 so as to supply the particles with theelectric charge.

Subsequently, electric current is applied to the electrode 14 andelectrode 26 such that the electrode 14 and electrode 26 serve as acathode and an anode, respectively, so as to form an electric field fordriving the negatively charged particles 34 from the wafer 30 to theelectrode 26. Please note that the polarity of the electrode 14 ischanged from an anode and a cathode. Simultaneously, the ultrasonicgenerator 18 applies an ultrasonic wave to particles 34 on a surface 32of a wafer 30 so as to induce removal of the particles 34 from thesurface 32. Particles 34 are removed from the surface 32, and float overthe wafer 32.

Preferably the floating particles removed from the wafer surface 32 arefurther removed from a gas by the electrode 26. The floating particlesmay be further ionized to facilitate trapping. Specifically, the coronavoltage may be applied again to the discharge electrode 54, which serveas a cathode, and the electrode 26, which serves as an anode, so as togenerate a corona discharge. As a result, a plurality of negativelycharged ions and electrons are generated in the vicinity of thedischarge electrodes 54, and a shower of the negatively charged ions andelectrons are driven in a direction toward the electrode 26 by anelectric field between the cathode 54 and the anode 26. The negativelycharged ions ionize the floating particles 34 over the wafer 30 so as tofacilitate the trapping of the further ionized particles by theelectrode 26.

Example 7

FIG. 5 is a schematic view of another embodiment of the presentinvention. The embodiment of FIG. 5 is similar to that of FIG. 2. InFIG. 5, an air knife 19, instead of the ultrasonic generator 18, is usedto apply a gas stream being free of particles onto the surface 32 of thewafer 30. In FIG. 5, an ionization device 60 replaces the ionizationdevice 40 in FIG. 2.

FIG. 6 is a cross section of the ionization device 60. The ionizationdevice 60 has a housing 61 having a cylindrical configuration defining abore extending along an axial direction. The housing 61 is preferablymade of an electrical insulator. The housing 61 has an electrode 66,which may have a cylindrical configuration being complementary in shapeto an inner surface of the housing 61.

The ionization device 60 has a support 62, which may have a barconfiguration extending in an axial direction of the housing 61, and aplurality of needles 64 protruding from the support 62 in generallyradial directions. The needles serve as discharge electrodes for coronadischarge.

The ionization device 60 has a heater 68 for generating convection. Theheater 68 rolls around the support 62 and being disposed between theneedles 64. The heater 68 warms up a local air in the bore for flowingthe local air upward through the bore so as to generate convection inthe chamber 38. The convection carries the negatively charged ions inthe bore of the housing 61 to the wafer 30, and carries the particles 34removed from the surface 32 of the wafer to the bore of the housing 61.The housing 61 is preferably held in a vertical direction so as tofacilitate the convection through the bore therein.

The corona voltage is applied to the discharge electrode 64, whichserves as a cathode, and the electrode 66, which serves as an anode, soas to generate a corona discharge. As a result, a plurality ofnegatively charged ions and electrons are generated in the vicinity ofthe discharge electrodes 64, and a shower of the negatively charged ionsand electrons are driven in a direction toward the electrode 66 by anelectric field between the cathode 64 and the anode 66.

Preferably, during the corona discharge, the heater 68 is turned on soas to generate the convection for carrying a local gas containing thenegatively charged ions in the bore of the housing to the top of thehousing 61 and further to an area over the wafer 30. The negativelycharged ions interact with the particles 34 on the surface 32 of thewafer 30 so as to ionize the particles 34.

The air knife 19 applies a gas stream being free of a particle onto thesurface 32 of the wafer 30 while an electric current is applied to theelectrode 14 as a cathode and the electrode 66 as an anode so as to forman electric field for driving the electrically charged particles fromthe surface 32 of the wafer 30 to the electrode 66.

Preferably, the corona voltage may be further applied to the dischargeelectrode 64, which serves as a cathode, and the electrode 66, whichserves as an anode, so as to generate a corona discharge. The negativelycharged ions thus produced further supply negative charges with thefloating particles removed from the surface 32, thereby facilitating thetrapping by the electrode 66. During the corona discharge, preferably,the heater 68 is turned on so as to generate the convection for carryingan air containing the floating, negatively charged particles to thelower end of the bore of the housing 41, thereby facilitating the trapby the electrode 66.

Example 8

The chamber 38 containing the apparatus 11 of Example 6 in FIG. 4 wasdisposed in a clean room of class 10, and following experiments arecarried out so as to confirm removal of particles from an article. Thechamber had a volume of 30 liters.

A high purity silicon wafer having a diameter of five inches was used.Polystyrene latex, which may be referred to PSL, standard particleshaving an average dimension of 0.5 and 1.0 micrometers were placed onthe silicon wafer 30 in two runs, respectively.

The ionization device 50 had a support 52 and a plurality of needles 54serving as discharge electrodes. An electric field between the dischargeelectrodes 54 and the electrode 14 having a plate configuration was setto 2.5 kilovolts per centimeter.

After the corona discharge, an electric field of 300 volts percentimeter between the discharge electrode 54 as a cathode and theelectrode 14 as an anode was applied for driving the negatively chargedions to the surface 32 of the wafer 30.

The ultrasonic generator 18 had a piezoelectric oscillator having 60kHz.

An electric field of 100 volts per centimeter between the electrode 26as an anode and the discharge electrode 54 as a cathode was applied fortrapping floating, negatively charged particles by the electrode 26.

A dust detector for a wafer was used to determine the number of theparticles made of polystyrene latex on a surface 32 of the wafer 30.

The number of particles on a surface 32 of the wafer are shown in Table3 so as to show the removal of the particles.

TABLE 3 Run No. 1 2 3 4 5 ionization step done none done none noneultrasonic step done done done done none electric field step done donenone none none particle 0.5 μm 30 900 850 1000 1050 size 1.0 μm 25 800750 850 900

In Table 3, the ionization step refers to the corona discharge and thesubsequent step of applying an electric field for driving the negativelycharged ions to the surface of the substrate. The ultrasonic step refersto applying an ultrasonic wave to the surface 32 of the wafer 30 by theultrasonic generator 18. The electric field step refers to forming anelectric field between the electrode 54 and electrode 26 for drivingcharged particles 34 from the surface 32 of the wafer 30 while applyingthe ultrasonic wave. “Done” refers to that the step was carried out.“None” refers to that the step was not carried out. The number refers tothe number of particles present on the top circular surface of the waferhaving a diameter of 5 inches.

Example 9

Using the aforementioned apparatus 11 of Example 6, a further experimentwas carried out for removal of floating particles originated from theparticles 34 on the surface 32 of the wafer. The ionization step, theultrasonic step and the electric field step of Example 8 were carriedout in the same conditions in two runs. Polystyrene latex particleshaving an average dimension of 0.5 micrometers were used.

After the electric field step, in one of the runs, the ionization stepwas carried out again for a period of 30 minutes so as to facilitateremoval of floating particles originated from the wafer surface by theelectrode 26. In contrast, this ionization step was not carried out inthe other run.

Subsequently, a particle-free nitrogen gas was introduced into thechamber 38 so as to purge the air therein, followed by determining thenumber of floating particles having a dimension of not less than 0.1micrometers per square feet in the chamber 38 by a particle counter. Theresult is shown in Table 4.

TABLE 4 ionization step the number of the particles per square feet done10 none 650-700

Example 10

FIG. 7 is a schematic view of an apparatus of the present invention in aclean room. The apparatus is disposed in a chamber 88, which in turn isdisposed in a clean room.

A rack 100 has a bottom portion 102, side walls 104, 105 being connectedto the bottom portion 102, and a plurality of protrusions 106 forseparating one wafer from another. The rack 100 may be made of asynthetic resin, such as polypropylene.

A wafer 90 having a plate configuration stands in generally transversedirections in the rack 100. The wafer 90 has a pair of main surfaces 92,96, and a plurality of particles 94 are present on one of the mainsurfaces 92.

In FIG. 7, an electrode 84 is disposed on an outer surface of the sidewall 104 so as to form an electric field between the electrode 74 andthe electrode 84. The electrode 84 is disposed in the opposite side ofthe wafer 90 with respect to the particles 94. The electrode 74 isdisposed in the same side of the wafer 90 with respect to the particles94. The electrode 84 may be a metallic coating on the outer surface ofthe side wall 104.

An apparatus has a device 70 for emitting a photoelectron 79 toward theelectrode 84. The device 70 has an ultraviolet lamp 72, a coating 74 ona surface of the ultraviolet lamp. The coating 74 is made of aphotoelectron emitting material, and the coating 74 may serve as one ofelectrodes for forming an electric field for driving a photoelectron.

An apparatus 10 has an air knife 89 for applying a gas stream onto asurface 94 of the wafer 90. The air knife 89 may be disposed in the sameside of the wafer with respect to the particles 94.

Another electrode 86 for trapping particles 94 removed from the wafer 90is disposed between the ultraviolet lamp 72 and the electrode 84. Theelectrode 86 may have a grid configuration and extend in horizontaldirections. The electrode 86 may be disposed above the rack 100.

In a method according to the present invention, the ultraviolet lamp 72is turned on so as to irradiate an ultraviolet ray onto the coating 74on the ultraviolet ramp 72, thereby emitting photoelectrons 79 from thecoating 74. While photoelectrons 79 are generated from the coating 74,electric current is applied to the coating 74 serving as a cathode andthe electrode 84 serving as an anode so as to form an electric field fordriving the photoelectrons 79 from the coating 74 to the electrode 84.During the passage, the photoelectrons 79 may interact with oxygen andwater molecules in an atmosphere so as to produce negatively chargedions thereof. The negatively charged ions along with the photoelectrons79 are driven toward the electrode 84 by the electric field. Thenegatively charged ions and/or photoelectrons 79 interact with particles94 on a surface 92 of the wafer 90 so as to supply the particles with anelectric charge.

Subsequently, electric current is applied to the electrode 84 andelectrode 86 such that the electrode 84 and electrode 86 serve as acathode and an anode, respectively, so as to form an electric field fordriving the negatively charged particles 94 from the wafer 90 to theelectrode 86. Please note that the polarity of the electrode 14 ischanged from an anode and a cathode. Simultaneously, the air knifeapplies a gas stream onto the surface 92 of a wafer 90. Particles 94 areremoved from the surface 92, and float over the wafer 90.

In the present invention, preferably the particles removed from thewafer 90 are further removed from a gas. The electrode 86 serving as thecathode may trap the floating particles. Preferably, the floatingparticles are further ionized to facilitate the trapping by the anode86.

In the present invention, the combination of ultrasonic wave or a gasstream and an electric field enables to remove particles having adimension smaller than 10 micrometers, particularly those smaller than 5micrometers and even those having a dimension smaller than 1 micrometer.The presence of a collecting member allows to further remove theresulting, floating particles removed from the article.

What is claimed is:
 1. An apparatus for removing particles from asurface of an article comprising: an ionizing device configured tosupply particles on the surface of the article with an electric charge,said ionizing device comprising a photoelectron emitting material and alight source configured to irradiate at least one of an ultraviolet rayand a radiation ray onto the photoelectron emitting material; at leastone of an ultrasonic generator configured to apply an ultrasonic wave tothe surface of the article and a stream source configured to generate agas stream onto the surface of the article; and a first electrodeconfigured to form an electric field for driving electrically chargedparticles from the surface of the article.
 2. An apparatus of claim 1wherein the ultrasonic generator comprises at least one of apiezoelectric oscillator, a polymer piezoelectric membrane, anelectrostrictive oscillator, a Langevin oscillator, a magnetostrictiveoscillator, an electrodynamic transformer, and a capacitor transformer.3. An apparatus of claim 1 wherein the ultrasonic generator comprises apiezoelectric oscillator.
 4. An apparatus of claim 1 wherein the streamsource comprises an air knife.
 5. An apparatus of claim 1 wherein theionizing device is is configured to conduct electric discharge.
 6. Anapparatus of claim 5 wherein the ionizing device comprises a pair ofsecond electrodes wherein electricity passes through a gas between thesecond electrodes.
 7. An apparatus of claim 5 wherein the ionizingdevice comprises a heater configured to generate convection.
 8. Anapparatus of claim 1 further comprising a trap configured to collectparticles removed from the article.
 9. An apparatus of claim 1 whereinthe trap comprises a third electrode configured to trap particlesremoved from the article.